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07-02-2019

Additive Production of Surfaces in Optical Quality

Two-Photon Grayscale Lithography System for Maskless Microfabrication

Quantum X: A maskless lithography system for the production of refractive and diffractive microoptics (© Nanoscribe)

Quantum X: A maskless lithography system for the production of refractive and diffractive microoptics (© Nanoscribe)

With the launch of the Quantum X, Nanoscribe GmbH, Eggenstein-Leopoldshafen, Germany, extends its portfolio of high-resolution additive manufacturing systems with a device for maskless production of high-precision microoptics.

The lithography system, which won the Innovation Award at the Laser World of Photonics in Munich, Germany, at the end of June, is designed for industrial microfabrication. According to the manufacturer, both prototypes and polymer masters of microoptics can be produced quickly, precisely and with surfaces in optical quality. The system can be operated via touch screen and has interfaces for industrial process control.

Miniaturized optics are required, for example, for sensors, mobile devices and communication. Quantum X is the world’s first industrial system based on Two-Photon Grayscale Lithography, the patent-pending technology developed by Nanoscribe, which combines the performance of grayscale lithography with the precision and flexibility of two-photon polymerization.

Company profile

Nanoscribe GmbH

Hermann-von-Helmholtz-Platz 1
DE 76344 Eggenstein-Leopoldshafen
Tel.: 7247 82-8841
Fax: 7247 82-8848

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