Nippon Gohsei: Licensing Agreement with Nanobiomatters
The Nippon Synthetic Chemical Industry Co., Ltd. (Nippon Gohsei), Osaka, Japan, announced that it has entered into an exclusive global licensing agreement with the Spanish company Nanobiomatters Industries S.L. for the exclusive use of its O2 Block Barrier additive in EVOH composites. Details of the agreement were not disclosed.
O2 Block Barrier is Nanobiomatter’s proprietary clay-based additive designed to dramatically improve the barrier properties of various polymers such as EVOH.
Nippon Gohsei will market their EVOH products using O2 Block Barrier under the “SoarnoL NC” series trade name. The company is now in the sampling stage with these products, and plans to have product ready for full commercial sales sometime in 2012.
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